Mitsui Chemicals collaborates with Dutch firm, ASML, on EUV pellicle business
Published Date | 2019 June 5
Mitsui Chemicals Signed a License Agreement with ASML for EUV pellicle is expected to grow their business expansion in EUV industry which will propel the global Extreme Ultraviolet Lithography (EUVL) market in future timeline
Global: Mitsui Chemicals, Inc. announced that it has concluded a license agreement for the EUV pellicle business with ASML, the global No.1 Company in the field of semiconductor lithography systems. The license agreement will bring synergy between ASMLs cutting edge technology of EUV pellicle and Mitsui Chemicals long term track record in the pellicle business. The collaboration will contribute to the adoption of EUV lithography technology through the supply of high-quality EUV pellicles in high volume, to support the rapidly growing demand in the market. ASML is the only manufacturer which has successfully developed EUV pellicles for commercial use in its EUV lithography systems. Under the license agreement, ASML will continue to develop the EUV pellicle technology.
According to BlueWeave Consulting, growing adoption of miniaturization and sophistication of electronic circuit devices will fuel the extreme ultraviolet lithography industry in the forecast period. Extreme ultraviolet lithography (EUVL) is an advanced microchip manufacturing technology that uses a single mask instead of multiple masks. EUVL is a highly precise technology that manufactures microchips supporting 10 GHz of clock speed. EUV lithography is helping to reduce the effort of designing new chips by simplifying engineers’ design flows and reducing the complexity of design validation. EUVL exhibits different properties at different wavelengths. For example, a typical industrial application of EUVL requires a high-power ultraviolet light source of a wavelength of 13.5 nm and throughput of 100 wafers per hour. Using EUVL, any can get compact electronic chips with fewer power requirements. The technology features enhanced resolving power and is cost-effective.
According to BlueWeave Consulting‘s upcoming report, Titled-“Global Extreme Ultraviolet Lithography (EUVL) Market, By Type (Lithium Cobalt Oxide, Lithium Manganese Oxide, Lithium Iron Phosphate and Others), By Components (Cathode, Anode, Electrolytic Solution, Others) By Application (Consumer Electronics, Industrial and Automotive), By Region, Size and Forecast 2019- 2025”- Global Extreme Ultraviolet Lithography (EUVL) Market is expected with grow with a significant rate in forecast period, 2019-2025 owing to increasing demand for compact ICs among the users globally. Upsurge in use of extreme ultraviolet lithography in the semiconductor industry and less number of masking layers compared to the argon fluoride immersion technology are expected to influence the Extreme Ultraviolet Lithography (EUVL) in the forecast period.