Mitsui Chemicals collaborates with Dutch firm, ASML, on EUV pellicle business
- Published | 05 June 2019
Mitsui Chemicals Signed a License Agreement with ASML
for EUV pellicle is expected to grow their business expansion in EUV industry
which will propel the global Extreme Ultraviolet Lithography (EUVL) market in
future timeline
Global: Mitsui Chemicals, Inc. announced
that it has concluded a license agreement for the EUV pellicle business with
ASML, the global No.1 Company in the field of semiconductor lithography
systems. The license agreement will bring synergy between ASMLs cutting edge
technology of EUV pellicle and Mitsui Chemicals long term track record in the
pellicle business. The collaboration will contribute to the adoption of EUV
lithography technology through the supply of high-quality EUV pellicles in high
volume, to support the rapidly growing demand in the market. ASML is the only
manufacturer which has successfully developed EUV pellicles for commercial use
in its EUV lithography systems. Under the license agreement, ASML will continue
to develop the EUV pellicle technology.
According
to BlueWeave Consulting, growing adoption of miniaturization and sophistication
of electronic circuit devices will fuel the extreme ultraviolet lithography
industry in the forecast period. Extreme ultraviolet lithography (EUVL) is an
advanced microchip manufacturing technology that uses a single mask instead of
multiple masks. EUVL is a highly precise technology that manufactures
microchips supporting 10 GHz of clock speed. EUV lithography is helping to
reduce the effort of designing new chips by simplifying engineers’ design flows
and reducing the complexity of design validation. EUVL exhibits different
properties at different wavelengths. For example, a typical industrial application
of EUVL requires a high-power ultraviolet light source of a wavelength of 13.5
nm and throughput of 100 wafers per hour. Using EUVL, any can get compact
electronic chips with fewer power requirements. The technology features
enhanced resolving power and is cost-effective.
According to BlueWeave Consulting‘s upcoming report, Titled-“Global Extreme
Ultraviolet Lithography (EUVL) Market, By Type (Lithium Cobalt Oxide, Lithium
Manganese Oxide, Lithium Iron Phosphate and Others), By Components (Cathode,
Anode, Electrolytic Solution, Others) By Application (Consumer Electronics,
Industrial and Automotive), By Region, Size and Forecast 2019- 2025”- Global Extreme Ultraviolet
Lithography (EUVL) Market is expected with grow with a significant rate in
forecast period, 2019-2025 owing to increasing demand for compact ICs among the
users globally. Upsurge
in use of extreme ultraviolet lithography in the semiconductor industry and
less number of masking layers compared to the argon fluoride immersion
technology are expected to influence the Extreme Ultraviolet Lithography (EUVL)
in the forecast period.
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